Sputter Target Development Capabilities

Sputter Target Development Capabilities

Custom Rotatable Spray Targets

  • Thermal spray
    • Plasma
    • Arc wire
  • Cold spray

    Custom Rotatable and Planar Cast Targets

    • Custom alloys
    • Li casting technology


    Conventional Powder-metallurgy/Ceramic Processing Methods

    • Rotatable and planar HIP targets
    • Hot-pressed (vacuum) planar targets
    • Sintered planar and rotatable targets



    • Planar and rotatable bonding form factors up to three meters in length
    • Metallic and elastomer bonding media
    • Vacuum brazing
    • Metallization






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